Novel photoresist stripping technology using steam-water mixture

被引：0

作者：

王磊 ^{[1
]}

惠瑜 ^{[1
]}

高超群 ^{[1
]}

景玉鹏 ^{[1
]}

机构：

[1] Microelectronic Equipment Technology DepartmentInstitute of Microelectronics,Chinese Academy of Sciences

来源：

Journal of Semiconductors | 2011年 / 32卷 / 02期

基金：

中国国家自然科学基金;

关键词：

photoresist stripping; plasma ash; wet stripping; steam-water mixture; jet spray;

D O I：

暂无

中图分类号：

TN305.7 [光刻、掩膜];

学科分类号：

1401 ;

摘要：

A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping.Experiments using this technology to strip hard baked SU-8 photoresist,aurum and chromium film are carried out.Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip photoresist and even metal film with ease.

引用

页码：142 / 148

页数：7

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