Study of Dihedral-Corner-Reflector-Array Fabrication Process Using Soft X-ray Deep X-ray Lithography

被引：0
|
作者：
Watanabe, Taki [1 ]
Amano, Sho [1 ]
Izawa, Shinya [1 ]
Maekawa, Satoshi [2 ]
Yoshiki, Keisuke
Yamaguchi, Akinobu [1 ,3 ]
Utsumi, Yuichi [1 ]
机构：
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, 3-1-2 Kouto, Kamigori, Hyogo 6781205, Japan
[2] Parity Innovat Co Ltd, Kyoto, Japan
[3] Inst Res Promot & Collaborat, Tokyo, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2023年 / 36卷 / 02期
关键词：
Synchrotron radiation; X-ray; LIGA; Microfabrication; DCRA; LIGA;
D O I：
暂无
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
We fabricated sectoral-pillar structures for Dihedral Corner Reflector Array (DCRA) using Deep X-ray Lithography (DXRL) in New SUBARU Synchrotron Radiation Facility. We studied process conditions such as a start timing of development after exposure and development temperature. We succeeded in fabricating a structure without of micro-cracks on sidewalls of the pillar and in demonstration of floating image using the fabricated DCRA.
引用
收藏
页码：97 / 100
页数：4
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