Study of Dihedral-Corner-Reflector-Array Fabrication Process Using Soft X-ray Deep X-ray Lithography

被引：0
|
作者：
Watanabe, Taki [1 ]
Amano, Sho [1 ]
Izawa, Shinya [1 ]
Maekawa, Satoshi [2 ]
Yoshiki, Keisuke
Yamaguchi, Akinobu [1 ,3 ]
Utsumi, Yuichi [1 ]
机构：
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, 3-1-2 Kouto, Kamigori, Hyogo 6781205, Japan
[2] Parity Innovat Co Ltd, Kyoto, Japan
[3] Inst Res Promot & Collaborat, Tokyo, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2023年 / 36卷 / 02期
关键词：
Synchrotron radiation; X-ray; LIGA; Microfabrication; DCRA; LIGA;
D O I：
暂无
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
We fabricated sectoral-pillar structures for Dihedral Corner Reflector Array (DCRA) using Deep X-ray Lithography (DXRL) in New SUBARU Synchrotron Radiation Facility. We studied process conditions such as a start timing of development after exposure and development temperature. We succeeded in fabricating a structure without of micro-cracks on sidewalls of the pillar and in demonstration of floating image using the fabricated DCRA.
引用
收藏
页码：97 / 100
页数：4
相关论文
共 50 条
  • [31] Fabrication of absorption gratings with X-ray lithography for X-ray phase contrast imaging
    Wang, Bo
    Wang, Yu-Ting
    Yi, Fu-Ting
    Zhang, Tian-Chong
    liu, Jing
    Zhou, Yue
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2018, 32 (13):
  • [32] A powerful soft X-ray source for X-ray lithography based on plasma focusing
    Bogolyubov, EP
    Bochkov, VD
    Veretennikov, VA
    Vekhoreva, LT
    Gribkov, VA
    Dubrovskii, AV
    Ivanov, YP
    Isakov, AI
    Krokhin, ON
    Lee, P
    Lee, S
    Nikulin, VY
    Serban, A
    Silin, PV
    Feng, X
    Zhang, GX
    PHYSICA SCRIPTA, 1998, 57 (04): : 488 - 494
  • [33] Fabrication of multimode polymeric waveguides and micromirrors using deep X-ray lithography
    Kim, JS
    Kim, JJ
    IEEE PHOTONICS TECHNOLOGY LETTERS, 2004, 16 (03) : 798 - 800
  • [34] Fabrication of x-ray lithography masks with optical lithography
    LaTulipe, D
    Maldonado, JR
    Mitchell, P
    Leduc, R
    Babich, I
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4345 - 4349
  • [35] Fabrication of x-ray lithography masks with optical lithography
    La, Tulipe, D.
    Maldonado, J.R.
    Mitchell, P.
    Leduc, R.
    Babich, I.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1996, 14 (06):
  • [36] Study of deep X-ray lithography behaviour for microstructures
    Chou, M. -C.
    Pan, C. T.
    Wu, T. T.
    Wu, C. T.
    SENSORS AND ACTUATORS A-PHYSICAL, 2008, 141 (02) : 703 - 711
  • [37] Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography
    Hirai, Y
    Hafizovic, S
    Matsuzuka, N
    Korvink, JG
    Tabata, O
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2006, 15 (01) : 159 - 168
  • [38] Kinoform X-ray lens creation in polymer materials by deep X-ray lithography
    Nazmov, V
    Shabel'nikov, L
    Pantenburg, FJ
    Mohr, J
    Reznikov, E
    Snigirev, A
    Snigireva, I
    Kouznetsov, S
    DiMichiel, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 217 (03): : 409 - 416
  • [39] Graphite-based x-ray masks for deep and ultradeep x-ray lithography
    Coane, P
    Giasolli, R
    De Caro, F
    Mancini, DC
    Desta, Y
    Göttert, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3618 - 3624
  • [40] Grating fabrication through X-ray lithography
    Mouroulis, P
    Hartley, FT
    Muller, RE
    Wilson, DW
    Shori, A
    Feldman, M
    Jiang, L
    Christenson, TR
    CURRENT DEVELOPMENTS IN LENS DESIGN AND OPTICAL ENGINEERING IV, 2003, 5173 : 108 - 114
12345