A Pathway Toward Sub-10 nm Surface Nanostructures Utilizing Block Copolymer Crystallization Control

被引:0
|
作者
Meinhardt, Alexander [1 ,2 ]
Qi, Peng [3 ]
David, Christian [3 ]
Maximov, Ivan [4 ]
Keller, Thomas F. [1 ,2 ]
机构
[1] Deutsch Elektronen Synchrotron DESY, Ctr X Ray & Nano Sci CXNS, D-22607 Hamburg, Germany
[2] Univ Hamburg, Dept Phys, D-22607 Hamburg, Germany
[3] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
[4] Lund Univ, NanoLund & Solid State Phys, SE-22100 Lund, Sweden
来源
ADVANCED MATERIALS INTERFACES | 2025年 / 12卷 / 06期
关键词
crystallization; diblock copolymer; directed self-assembly; extended chain; in situ AFM; vertical nanostructure; DIBLOCK COPOLYMER; THIN-FILMS; EXTENDED-CHAIN; OXIDE); POLYETHYLENE; MORPHOLOGIES; TRANSITION; KINETICS; BEHAVIOR; TRENDS;
D O I
10.1002/admi.202400661
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
It is elucidated how crystallization can be used to create lateral surface nanostructures in a size regime toward sub-10 nm using molecular self-assembly of short chain crystallizable block copolymers (BCP) and assist in overcoming the high-chi barrier for microphase separation. In this work, an amphiphilic double-crystalline polyethylene-b-polyethylene oxide (PE-b-PEO) block co-oligomer is used. A crystallization mechanism of the short-chain BCP in combination with neutral wetting of the functionalized substrate surface that permits to form edge-on, extended chain crystal lamellae with enhanced thermodynamic stability. In situ atomic force microscopy (AFM) analysis along with surface energy considerations suggest that upon cooling from the polymer melt, the PE-b-PEO first forms a segregated horizontal lamellar morphology. AFM analysis indicates that the PEO crystallization triggers a morphological transition involving a rotation of the forming extended chain crystals in edge-on orientation. Exposing their crystal side facets to the top surface permits to minimize their interfacial energy and form vertical nanostructures. Moreover, the edge-on lamellae can be macroscopically aligned by directed self-assembly (DSA), one necessity for various nanotechnological applications. It is believed that the observed mechanism to form stable edge-on lamellae can be transferred to other crystallizable short chain BCPs, providing potential pathways for sub-10 nm nanotechnology.
引用
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页数:10
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