A Pathway Toward Sub-10 nm Surface Nanostructures Utilizing Block Copolymer Crystallization Control

被引:0
|
作者
Meinhardt, Alexander [1 ,2 ]
Qi, Peng [3 ]
David, Christian [3 ]
Maximov, Ivan [4 ]
Keller, Thomas F. [1 ,2 ]
机构
[1] Deutsch Elektronen Synchrotron DESY, Ctr X Ray & Nano Sci CXNS, D-22607 Hamburg, Germany
[2] Univ Hamburg, Dept Phys, D-22607 Hamburg, Germany
[3] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
[4] Lund Univ, NanoLund & Solid State Phys, SE-22100 Lund, Sweden
来源
ADVANCED MATERIALS INTERFACES | 2025年 / 12卷 / 06期
关键词
crystallization; diblock copolymer; directed self-assembly; extended chain; in situ AFM; vertical nanostructure; DIBLOCK COPOLYMER; THIN-FILMS; EXTENDED-CHAIN; OXIDE); POLYETHYLENE; MORPHOLOGIES; TRANSITION; KINETICS; BEHAVIOR; TRENDS;
D O I
10.1002/admi.202400661
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
It is elucidated how crystallization can be used to create lateral surface nanostructures in a size regime toward sub-10 nm using molecular self-assembly of short chain crystallizable block copolymers (BCP) and assist in overcoming the high-chi barrier for microphase separation. In this work, an amphiphilic double-crystalline polyethylene-b-polyethylene oxide (PE-b-PEO) block co-oligomer is used. A crystallization mechanism of the short-chain BCP in combination with neutral wetting of the functionalized substrate surface that permits to form edge-on, extended chain crystal lamellae with enhanced thermodynamic stability. In situ atomic force microscopy (AFM) analysis along with surface energy considerations suggest that upon cooling from the polymer melt, the PE-b-PEO first forms a segregated horizontal lamellar morphology. AFM analysis indicates that the PEO crystallization triggers a morphological transition involving a rotation of the forming extended chain crystals in edge-on orientation. Exposing their crystal side facets to the top surface permits to minimize their interfacial energy and form vertical nanostructures. Moreover, the edge-on lamellae can be macroscopically aligned by directed self-assembly (DSA), one necessity for various nanotechnological applications. It is believed that the observed mechanism to form stable edge-on lamellae can be transferred to other crystallizable short chain BCPs, providing potential pathways for sub-10 nm nanotechnology.
引用
收藏
页数:10
相关论文
共 50 条
  • [31] Challenges facing directed assembly of block copolymers: Nanopatterning at the sub-10 nm scale
    Buriak, Jillian
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2015, 249
  • [32] Isoporous membranes with sub-10 nm pores prepared from supramolecular interaction facilitated block copolymer assembly and application for protein separation
    Zhu, Guo-dong
    Ying, Yu-rong
    Li, Xuan
    Liu, Yang
    Yang, Cao-ying
    Yi, Zhuan
    Gao, Cong-jie
    JOURNAL OF MEMBRANE SCIENCE, 2018, 566 : 25 - 34
  • [33] Catalytic studies for sub-10 nm platinum alloy nanocrystals with size control
    Tsung, Chia-Kuang
    Huang, Wenyu
    Li, Yimin
    Kuhn, John N.
    Somorjai, Gabor A.
    Yang, Peidong
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2010, 239
  • [34] Functional block copolymer materials and their assembly at sub 10 nm length scale
    Gopalan, Padma
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2014, 247
  • [35] Orientation control of high-χ triblock copolymer for sub-10 nm patterning using fluorine-containing polymeric additives
    Li, Jiajing
    Zhou, Chun
    Chen, Xuanxuan
    Delgadillo, Paulina A. Rincon
    Nealey, Paul F.
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019, 18 (03):
  • [36] Self- assembly morphology of block copolymers in sub-10 nm topographical guiding patterns
    Gottlieb, S.
    Rosner, B.
    Evangelio, L.
    Fernandez-Regulez, M.
    Nogales, A.
    Garcia-Gutierrez, M. C.
    Keller, T. F.
    Fraxedas, J.
    Ezquerra, T. A.
    David, C.
    Perez-Murano, F.
    MOLECULAR SYSTEMS DESIGN & ENGINEERING, 2019, 4 (01) : 175 - 185
  • [37] Sub-10 nm Nanofabrication via Nanoimprint Directed Self-Assembly of Block Copolymers
    Park, Sang-Min
    Liang, Xiaogan
    Harteneck, Bruce D.
    Pick, Teresa E.
    Hiroshiba, Nobuya
    Wu, Ying
    Helms, Brett A.
    Olynick, Deirdre L.
    ACS NANO, 2011, 5 (11) : 8523 - 8531
  • [38] Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films
    Aissou, Karim
    Mumtaz, Muhammad
    Fleury, Guillaume
    Portale, Giuseppe
    Navarro, Christophe
    Cloutet, Eric
    Brochon, Cyril
    Ross, Caroline A.
    Hadziioannou, Georges
    ADVANCED MATERIALS, 2015, 27 (02) : 261 - 265
  • [39] A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films
    Kim, Eunjin
    Kim, Wonjung
    Lee, Kwang Hee
    Ross, Caroline A.
    Son, Jeong Gon
    ADVANCED FUNCTIONAL MATERIALS, 2014, 24 (44) : 6981 - 6988
  • [40] Tin-containing block copolymers for the direct pattern transfer of sub-10 nm features
    Maher, Michael
    Mori, Kazunori
    Sirard, Stephen
    Gurer, Emir
    Bates, Christopher
    Dinhobl, Andrew
    Blachut, Gregory
    Ellison, Christopher
    Willson, Carlton
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2016, 251