On the Thermal Dependency of Electrical Properties Between MoS2 and WS2-Based 2-D MOSFETs

被引:0
|
作者
Majumder, Tanmoy [1 ]
Debbarma, Sebika [2 ]
Chakraborty, Udayan [2 ]
Dasgupta, Sudeb [3 ]
Das, Narottam [4 ]
Bhattacharjee, Abhishek [2 ]
机构
[1] VIT, Sch Elect Engn SENSE, Chennai, India
[2] Tripura Inst Technol, Dept Elect & Commun Engn, Agartala, India
[3] IIT Roorkee, Dept Elect & Commun Engn, Roorkee, India
[4] Cent Queensland Univ, Sch Engn & Technol, Melbourne, Australia
关键词
DIBL; MoS2; R-ch; Temperature; WS2; 2D-MOSFET; RECONFIGURABLE FET; PERFORMANCE; TRANSISTORS; IMPACT; WS2;
D O I
10.1080/03772063.2025.2473536
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we present a detailed comparative performance analysis between MoS2 and WS2 2-D MOSFETs under varying temperature conditions. Although the WS2 device shows 68.55 mu A/mu m better on current at room temperature than the MOS2 one, the off-state leakage current is found to deteriorate in both cases with an increase in temperature mainly due to thermionic emission. Moreover, a lowering of R-ch and better transconductance behaviour at higher temperatures is observed which is related to the predominant self-heating effect in these nanoscale SB devices. Lastly, it is seen that a thin gate oxide with a mediocre dielectric constant provides the best short-channel performance and device electrostatics for the two devices under consideration.
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页数:13
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