Homoepitaxial layers of gallium nitride grown by metallorganic vapour phase epitaxy

被引:0
|
作者
High Pressure Research Cent Polish, Acad of Sciences, Warsaw, Poland [1 ]
机构
来源
Semicond Sci Technol | / 2卷 / 240-243期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Effect of reactor pressure on qualities of GaN layers grown by hydride vapour phase epitaxy
    Qiu Kai
    Yin Zhi-Jun
    Li Xin-Hua
    Zhong Fei
    Ji Chang-Jian
    Han Qi-Feng
    Cao Xian-Cun
    Chen Jia-Rong
    Luo Xiang-Dong
    Wang Yu-Qi
    CHINESE PHYSICS LETTERS, 2007, 24 (05) : 1390 - 1392
  • [32] Photoreflectance spectroscopy of thick GaN layers grown by hydride vapour phase epitaxy technique
    Syperek, M
    Kudrawiec, R
    Misiewicz, J
    Korbutowicz, R
    Paszkiewicz, R
    Tlaczala, M
    OPTICA APPLICATA, 2005, 35 (03) : 529 - 535
  • [33] INFLUENCE OF GROWTH-CONDITIONS ON PROPERTIES OF INP HOMOEPITAXIAL LAYERS GROWN BY LIQUID-PHASE EPITAXY
    STOJANOFF, V
    SHAHID, MA
    MCDEVITT, TL
    MAHAJAN, S
    SCHLESINGER, TE
    BONNER, WA
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1989, 3 (03): : 279 - 285
  • [34] PHOTOLUMINESCENCE OF ZNTE HOMOEPITAXIAL LAYERS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY AT LOW-PRESSURE
    OGAWA, H
    NISHIO, M
    JOURNAL OF APPLIED PHYSICS, 1989, 66 (08) : 3919 - 3921
  • [35] Origin of Unintentional Gallium Incorporation into AlN Layers Grown by Metalorganic Vapor Phase Epitaxy
    Yamada, Atsushi
    Ishiguro, Tetsuro
    Kotani, Junji
    Tomabechi, Shuichi
    Nakamura, Norikazu
    2016 COMPOUND SEMICONDUCTOR WEEK (CSW) INCLUDES 28TH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE & RELATED MATERIALS (IPRM) & 43RD INTERNATIONAL SYMPOSIUM ON COMPOUND SEMICONDUCTORS (ISCS), 2016,
  • [36] Spatially controlled VLS epitaxy of gallium arsenide nanowires on gallium nitride layers
    Blumberg, C.
    Liborius, L.
    Ackermann, J.
    Tegude, F-J
    Poloczek, A.
    Prost, W.
    Weimanne, N.
    CRYSTENGCOMM, 2020, 22 (07) : 1239 - 1250
  • [37] Transmission electron microscopy characterization of metallorganic chemical vapour deposition grown GaN layers
    Pecz, B.
    di Forte-Poisson, M.A.
    Toth, L.
    Radnoczi, G.
    Huhn, G.
    Papaioannou, V.
    Stoemenos, J.
    Materials science & engineering. B, Solid-state materials for advanced technology, 1998, B50 (1-3): : 93 - 96
  • [38] Numerical design of Metal-Organic Vapour Phase Epitaxy process for gallium nitride epitaxial growth
    Skibinski, J.
    Caban, P.
    Wejrzanowski, T.
    Oliver, G. J.
    Kurzydlowski, K. J.
    CRYSTAL RESEARCH AND TECHNOLOGY, 2016, 51 (12) : 762 - 770
  • [39] Shape of indium nitride quantum dots and nanostructures grown by metal organic vapour phase epitaxy
    Ploch, Simon
    Meissner, Christian
    Pristovsek, Markus
    Kneissl, Michael
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 2, 2009, 6 : S574 - S577
  • [40] Gallium nitride grown by molecular beam epitaxy at low temperatures
    Jeffries, A. M.
    Ding, L.
    Williams, J. J.
    Williamson, T. L.
    Hoffbauer, M. A.
    Honsberg, C. B.
    Bertoni, M. I.
    THIN SOLID FILMS, 2017, 642 : 25 - 30