共 50 条
- [2] The application of low-frequency glow discharge to high-rate a-Si:H deposition CONFERENCE RECORD OF THE TWENTY SIXTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 1997, 1997, : 643 - 646
- [3] a-Si:H/c-Si heterostructures prepared by 55 kHz glow discharge high-rate deposition technique J Non Cryst Solids, Pt 2 (1123-1126):
- [5] The perspectives of high-rate low frequency a-Si:H films deposition:: Solar cell application and stability control THIN-FILM STRUCTURES FOR PHOTOVOLTAICS, 1998, 485 : 297 - 302
- [6] High-rate deposition of a-Si:H films in 55kHz glow discharge:: Growth mechanisms and film structure AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997, 1997, 467 : 585 - 590
- [8] High-rate growth of stable a-Si:H AMORPHOUS AND HETEROGENEOUS SILICON THIN FILMS: FUNDAMENTALS TO DEVICES-1999, 1999, 557 : 105 - 114
- [9] High-rate growth of stable a-Si:H Materials Research Society Symposium - Proceedings, 1999, 557 : 105 - 114
- [10] OPTICAL PROPERTIES OF A-Si:H OBTAINED IN HIGH-FREQUENCY GLOW DISCHARGE. Soviet Physics - Lebedev Institute Reports (English Translation of Sbornik Kratkie Soobshcheniya p, 1984, (07): : 55 - 59