Artefacts in electron holography

被引：0

作者：

Institute for Applied Physics, Dresden University of Technology, D-01062 Dresden, Germany ^{[1
]}

不详 ^{[2
]}

不详 ^{[3
]}

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来源：

ULTRAMICROSCOPY | / 1-4卷 / 67-77期

关键词：

Aberrations - Holography - Imaging techniques - Mathematical techniques - Particle optics;

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摘要：

In off-axis electron holography artefacts may arise specific to the method. In particular at high resolution they must be taken into account to obtain reliable results after correction of aberrations. In the following we describe some artefacts which we have found to be most essential so far.

引用

共 50 条

[31] PRESENT AND FUTURE OF ELECTRON HOLOGRAPHY
TONOMURA, A
JOURNAL OF ELECTRON MICROSCOPY, 1989, 38 : S43 - S50
[32] ELECTRON HOLOGRAPHY OF FLUX LINES
TONOMURA, A
PHYSICA C, 1991, 185 : 253 - 258
[33] ELECTRON HOLOGRAPHY FOR POLYMER MICROSCOPY
JOY, DC
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1992, 203 : 263 - POLY
[34] HOLOGRAPHY IN ELECTRON-MICROSCOPY
HANSZEN, KJ
ADVANCES IN ELECTRONICS AND ELECTRON PHYSICS, 1982, 59 : 1 - 77
[35] LIMITING RESOLUTION IN ELECTRON HOLOGRAPHY
ANASKIN, IF
STOYANOV.IG
EDINTSOV, NM
RADIOTEKHNIKA I ELEKTRONIKA, 1972, 17 (02): : 430 - &
[36] EXPERIMENTAL ELECTRON HOLOGRAPHY.
Munch, Jesper
Optik (Jena), 1975, 43 (01): : 79 - 99
[37] ELECTRON HOLOGRAPHY FOR MAGNETIC MICROSTRUCTURES
FROST, B
LICHTE, H
EUREM 88, VOLS 1-3: TUTORIALS, INSTRUMENTATION AND TECHNIQUES / PHYSICS AND MATERIALS / BIOLOGY, 1988, 93 : 267 - 268
[38] Aberration Correction and Electron Holography
Lichte, Hannes
Linck, Martin
Geiger, Dorin
Lehmann, Michael
MICROSCOPY AND MICROANALYSIS, 2010, 16 (04) : 434 - 440
[39] INTERFERENCE MICROSCOPY BY ELECTRON HOLOGRAPHY
TONOMURA, A
MATSUDA, T
ENDO, J
JOURNAL OF ELECTRON MICROSCOPY, 1979, 28 (03): : 246 - 246
[40] Electron holography with atomic focusers
Cowley, JM
PHYSICAL REVIEW LETTERS, 2000, 84 (16) : 3618 - 3621

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