Investigation of the annealing behavior of damage in Si implanted InP by photoacoustic and Raman spectroscopy

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作者
Kuwahata, Hiroshi [1 ]
Uehara, Fumiya [1 ]
Matsumori, Tokue [1 ]
Muto, Nobuo [1 ]
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[1] Tokai Univ, Kanagawa, Japan
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14
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页码:459 / 462
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