Defect detection on patterned wafers

被引:0
|
作者
Baliga, John
机构
来源
Semiconductor International | 1997年 / 20卷 / 05期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] A nondestructive automated defect detection system for silicon carbide wafers
    Toshiro Kubota
    Parag Talekar
    Xianyun Ma
    Tangali S. Sudarshan
    Machine Vision and Applications, 2005, 16 : 170 - 176
  • [22] A nondestructive automated defect detection system for silicon carbide wafers
    Kubota, T
    Talekar, P
    Ma, XY
    Sudarshan, TS
    MACHINE VISION AND APPLICATIONS, 2005, 16 (03) : 170 - 176
  • [23] INSPECTION SYSTEM FOR PARTICULATE AND DEFECT DETECTION ON PRODUCT WAFERS.
    Anon
    IBM technical disclosure bulletin, 1985, 27 (12): : 6971 - 6973
  • [24] HEURISTIC APPROACH TO PARTICLE-DETECTION ON VIRGIN AND PATTERNED SILICON-WAFERS
    ALLEMAND, CD
    DANKO, JJ
    OPTICAL ENGINEERING, 1995, 34 (02) : 548 - 563
  • [25] Verification of the system of defect inspection on patterned wafers using sub-200 nm wavelength light
    Takahashi, Tetsuo
    Miyazakia, Yoko
    Tanaka, Toshihiko
    Terasawa, Tsuneo
    Takeuchi, Naoya
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XX, PTS 1 AND 2, 2006, 6152
  • [26] Content based segmentation of patterned wafers
    Bourgeat, P
    Meriaudeau, F
    Tobin, KW
    JOURNAL OF ELECTRONIC IMAGING, 2004, 13 (03) : 428 - 435
  • [27] Sensor for monitoring the rinsing of patterned wafers
    Yan, J
    Seif, D
    Raghavan, S
    Vermeire, B
    Barnaby, HJ
    Peterson, T
    Shadman, F
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2004, 17 (04) : 531 - 537
  • [28] Optical topography measurement of patterned wafers
    de Lega, XC
    de Groot, P
    Characterization and Metrology for ULSI Technology 2005, 2005, 788 : 432 - 436
  • [29] Defect detection of color-patterned fabric based on DenoisingGAN
    Zhang, Hongwei
    Wang, Shihao
    Mi, Hongmin
    Lu, Shuai
    Yao, Le
    Ge, Zhiqiang
    INTERNATIONAL JOURNAL OF CLOTHING SCIENCE AND TECHNOLOGY, 2023, 35 (06) : 865 - 888
  • [30] Data-driven approaches to optical patterned defect detection
    Henn, Mark-Alexander
    Zhou, Hui
    Barnes, Bryan M.
    OSA CONTINUUM, 2019, 2 (09) : 2683 - 2693