NEW POSITION ALIGNMENT METHOD IN ELECTRON-BEAM DIRECT WRITING LITHOGRAPHY USING THE SEM.

被引：0
|
作者：
Park, Sun-Woo [1 ]
Shono, Katsufusa [1 ]
Dumin, David J. [1 ]
机构：
[1] Sophia Univ, Tokyo, Jpn, Sophia Univ, Tokyo, Jpn
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1987年 / 26卷 / 06期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
2
引用
收藏
相关论文
共 50 条
  • [21] Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography
    Erhan Bat
    Juneyoung Lee
    Uland Y. Lau
    Heather D. Maynard
    Nature Communications, 6
  • [22] Direct electron-beam writing with high aspect ratio for fabricating ion-beam lithography mask
    Lee, BN
    Cho, YH
    Kim, YS
    Hong, W
    Woo, HJ
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2003, 42 : S199 - S201
  • [23] POSITIVE RESISTS FOR DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY
    GOZDZ, AS
    SOLID STATE TECHNOLOGY, 1987, 30 (06) : 75 - 79
  • [24] Model-based lithography verification system for multilayer structure in electron-beam direct writing
    Ogino, Kozo
    Hoshino, Hiromi
    Machida, Yasuhide
    EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 : U1126 - U1135
  • [25] A DIRECT WRITING ELECTRON-BEAM LITHOGRAPHY BASED PROCESS FOR THE REALIZATION OF OPTOELECTRONIC INTEGRATED-CIRCUITS
    HUGHES, WA
    BARNARD, JA
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 517 : 28 - 33
  • [26] Proximity correction for fabricating a chirped diffraction grating by direct-writing electron-beam lithography
    Okano, M
    Kikuta, H
    Hirai, Y
    Yamamoto, K
    Yotsuya, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (9A): : 5602 - 5606
  • [27] SUCCESSIVE DEVELOPMENT OPTIMIZATION OF RESIST KINOFORMS MANUFACTURED WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY
    LARSSON, M
    EKBERG, M
    NIKOLAJEFF, F
    HARD, S
    APPLIED OPTICS, 1994, 33 (07): : 1176 - 1179
  • [28] NEW TECHNIQUES ALTERNATIVE TO OPTICAL LITHOGRAPHY - ELECTRON-BEAM LITHOGRAPHY
    TAKIGAWA, T
    DENKI KAGAKU, 1987, 55 (05): : 358 - 362
  • [29] PROJECTION ELECTRON-BEAM LITHOGRAPHY - A NEW APPROACH
    BERGER, SD
    GIBSON, JM
    CAMARDA, RM
    FARROW, RC
    HUGGINS, HA
    KRAUS, JS
    LIDDLE, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2996 - 2999
  • [30] STITCHING WITH OVERLAY IN DIRECT WAFER WRITING USING SCANNING ELECTRON-BEAM
    WILSON, AD
    KERN, A
    KIRK, J
    DOOLY, C
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C104 - C104
12345