SUCCESSIVE DEVELOPMENT OPTIMIZATION OF RESIST KINOFORMS MANUFACTURED WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY

被引：24
|
作者：
LARSSON, M
EKBERG, M
NIKOLAJEFF, F
HARD, S
机构：
[1] Department of Microwave Technology, Chalmers University of Technology, Göeborg
来源：
APPLIED OPTICS | 1994年 / 33卷 / 07期
关键词：
DIRECT WRITING; ELECTRON-BEAM LITHOGRAPHY; OPTIMIZATION; DEVELOPMENT; RESIST KINOFORMS; BINARY PHASE GRATINGS; BLAZED PHASE GRATINGS; DIFFRACTIVES OPTICS;
D O I：
10.1364/AO.33.001176
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.
引用
收藏
页码：1176 / 1179
页数：4
相关论文
共 50 条
  • [1] DEVELOPMENT OF POSITIVE ELECTRON-BEAM RESIST FOR 50 KV ELECTRON-BEAM DIRECT-WRITING LITHOGRAPHY
    SAKAMIZU, T
    YAMAGUCHI, H
    SHIRAISHI, H
    MURAI, F
    UENO, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2812 - 2817
  • [2] MICROWAVE SAW RESONATORS FABRICATED WITH DIRECT-WRITING ELECTRON-BEAM LITHOGRAPHY
    CROSS, P
    RISSMAN, P
    SHREVE, W
    IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1981, 28 (05): : 364 - 364
  • [3] Proximity correction for fabricating a chirped diffraction grating by direct-writing electron-beam lithography
    Okano, M
    Kikuta, H
    Hirai, Y
    Yamamoto, K
    Yotsuya, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (9A): : 5602 - 5606
  • [4] Direct laser writing lithography using a negative-tone electron-beam resist
    Kim, H. S.
    Son, B. H.
    Kim, Y. C.
    Ahn, Y. H.
    OPTICAL MATERIALS EXPRESS, 2020, 10 (11) : 2805 - 2810
  • [5] Precise proximity correction for fabricating chirped diffraction gratings with the direct-writing electron-beam lithography
    Okano, M
    Yotsuya, T
    Hirai, Y
    Kikuta, H
    Yamamoto, K
    LITHOGRAPHIC AND MICROMACHINING TECHNIQUES FOR OPTICAL COMPONENT FABRICATION, 2001, 4440 : 268 - 276
  • [6] Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography
    Ekberg, M.
    Nikolajeff, F.
    Larsson, M.
    Hard, S.
    Doktorsavhandlingar vid Chalmers Tekniska Hogskola, 1997, (1263): : 103 - 107
  • [7] PROXIMITY-COMPENSATED BLAZED TRANSMISSION GRATING MANUFACTURE WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY
    EKBERG, M
    NIKOLAJEFF, F
    LARSSON, M
    HARD, S
    APPLIED OPTICS, 1994, 33 (01): : 103 - 107
  • [8] RESIST HEATING EFFECT IN DIRECT ELECTRON-BEAM WRITING
    ABE, T
    OHTA, K
    WADA, H
    TAKIGAWA, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 853 - 857
  • [9] Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms
    Nikolajeff, Fredrik
    Bengtsson, Jorgen
    Larsson, Michael
    Ekberg, Mats
    Hard, Sverker
    1997,
  • [10] Preparation of patterned media with electron beam direct-writing lithography and electrodeposition
    Chao, Shuzhe
    Ding, Yucheng
    Ye, Xiangdong
    Li, Dichen
    Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University, 2009, 43 (03): : 27 - 30
12345