Analysis of Pb centers at the Si(111)/SiO2 interface following rapid thermal annealing

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[1] Hurley, P.K.
[2] Stesmans, A.
[3] Afanas'ev, V.V.
[4] O'Sullivan, B.J.
[5] O'Callaghan, E.
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Hurley, P.K. (phurley@nmrc.ie) | 1600年 / American Institute of Physics Inc.卷 / 93期
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