RF selfbias voltage and sheath width in inductively coupled chlorine plasma

被引：0

作者：

Shindo, Haruo ^{[1
]}

Fukasawa, Takayuki ^{[1
]}

Nakamura, Akihiro ^{[1
]}

Horiike, Yasuhiro ^{[1
]}

机构：

[1] Fukuyama Univ, Fukuyama, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 2 A期

关键词：

701.2 Magnetism: Basic Concepts and Phenomena - 714.2 Semiconductor Devices and Integrated Circuits - 804.2 Inorganic Compounds - 932.3 Plasma Physics - 942.2 Electric Variables Measurements;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：620 / 622

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