RF selfbias voltage and sheath width in inductively coupled chlorine plasma

被引：0
|
作者：
Shindo, Haruo [1 ]
Fukasawa, Takayuki [1 ]
Nakamura, Akihiro [1 ]
Horiike, Yasuhiro [1 ]
机构：
[1] Fukuyama Univ, Fukuyama, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 2 A期
关键词：
701.2 Magnetism: Basic Concepts and Phenomena - 714.2 Semiconductor Devices and Integrated Circuits - 804.2 Inorganic Compounds - 932.3 Plasma Physics - 942.2 Electric Variables Measurements;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
9
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收藏
页码：620 / 622
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