High-rate selective etching of a-Si:H using hydrogen radicals

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[1] Nagayoshi, Hiroshi
[2] Yamaguchi, Misako
[3] Kamisako, Koichi
[4] Horigome, Takashi
[5] Tarui, Yasuo
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Nagayoshi, Hiroshi | 1600年 / JJAP, Minato-ku, Japan卷 / 33期
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Etching;
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