Pulsed-laser deposition of ZnS and SrS for ACTFEL and field-emission displays

被引:0
|
作者
Karner, C. [1 ]
Maguire, P. [1 ]
McLaughlin, J. [1 ]
Laverty, S. [1 ]
Graham, W.G. [1 ]
Morrow, T. [1 ]
Bowman, R.M. [1 ]
机构
[1] Univ of Ulster, Belfast, United Kingdom
来源
关键词
Cathodoluminescence - Crystal orientation - Deposition - Film growth - Luminescent devices - Manganese - Phosphors - Semiconductor doping - Stoichiometry - Strontium compounds - Substrates - Zinc compounds;
D O I
暂无
中图分类号
学科分类号
摘要
High-quality luminescent thin films of manganese-doped zinc sulphide (ZnS:Mn) and strontium sulphide (SrS) with excellent stoichiometry have been grown by pulsed-laser deposition (PLD). The crystallinity, stoichiometry, and cathodoluminescence have been investigated for films deposited onto two different substrate types under different deposition conditions. Furthermore, the importance of post-deposition annealing has been studied. PLD ZnS:Mn thin films show increased cathodoluminescence (CL) when compared to sputtered thin films, peaking at 585 nm. SrS thin films grown at 450 °C onto tin-doped indium oxide (ITO) coated glass substrates show very good crystallinity, with a preferred orientation along the (200) axis. Cerium-doped strontium sulphide (SrS:Ce) gives strong blue CL output at 400 nm. The films are stoichiometric and it has been shown that the stoichiometry is controllable by varying the deposition parameters.
引用
收藏
页码:43 / 47
相关论文
共 50 条
  • [31] Optical and Field-Emission Properties of ZnO Nanostructures Deposited Using High-Pressure Pulsed Laser Deposition
    Premkumar, T.
    Zhou, Y. S.
    Lu, Y. F.
    Baskar, K.
    ACS APPLIED MATERIALS & INTERFACES, 2010, 2 (10) : 2863 - 2869
  • [32] PULSED-LASER DEPOSITION OF EPITAXIAL LAYERS OF ZNSE
    DEISS, JL
    CHERGUI, A
    KOUTTI, L
    LOISON, JL
    ROBINO, M
    GRUN, JB
    APPLIED SURFACE SCIENCE, 1995, 86 (1-4) : 149 - 153
  • [33] Growth of ZnSe nanowires by pulsed-laser deposition
    Zhang, Tinwei
    Shen, Yiqun
    Hu, Wei
    Sun, Jian
    Wu, Jiada
    Ying, Zhifeng
    Xu, Ning
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06): : 1823 - 1826
  • [34] New developments of pulsed-laser deposition process
    Okada, T
    Nakata, Y
    Muramoto, J
    Maeda, M
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING III, 1998, 3274 : 246 - 254
  • [35] ION-ASSISTED PULSED-LASER DEPOSITION
    READE, RP
    CHURCH, SR
    RUSSO, RE
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (06): : 3610 - 3614
  • [36] Pulsed-laser deposition and characterization of thin films
    Bäuerle, D
    Dinescu, M
    Dinu, R
    Pedarnig, J
    Heitz, J
    Schwödiauer, R
    Bauer, S
    Bauer-Gogonea, S
    PIEZOELECTRIC MATERIALS: ADVANCES IN SCIENCE, TECHNOLOGY AND APPLICATIONS, 2000, 76 : 261 - 271
  • [37] THE DEVELOPMENT OF A SPRAYER FOR FIELD-EMISSION DEPOSITION
    PREWETT, PD
    GOWLAND, L
    AITKEN, KL
    MAHONY, CMO
    THIN SOLID FILMS, 1981, 80 (1-3) : 117 - 124
  • [38] SYNTHESIS OF METASTABLE NITRIDES BY PULSED-LASER DEPOSITION
    TREECE, RE
    HORWITZ, JS
    CHRISEY, DB
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1994, 208 : 622 - INOR
  • [39] REACTIVE PULSED-LASER DEPOSITION OF CNX FILMS
    ZHAO, XA
    ONG, CW
    TSANG, YC
    WONG, YW
    CHAN, PW
    CHOY, CL
    APPLIED PHYSICS LETTERS, 1995, 66 (20) : 2652 - 2654
  • [40] Pulsed-laser deposition and characterization of TaC films
    Universita della Basilicata, Potenza, Italy
    Appl Surf Sci, 1 (190-195):