SnO2 Nanocrystalline Thin Films by XPS

被引：53
|
作者：
Barreca, Davide [1 ]
Garon, Simona [2 ]
Tondello, Eugenio [3 ]
Zanella, Pierino [4 ]
机构：
[1] Dipartimento C.I.M.A., Universití  di Padova, Via Loredan, 4, Padova,35131, Italy
[2] I.C.T.I.M.A., Corso Stati Uniti, 4, Padova,35127, Italy
[3] Dipartimento C.I.M.A., Universití  di Padova, Via Loredan, 4, Padova,35131, Italy
[4] I.C.T.I.M.A., Corso Stati Uniti, 4, Padova,35127, Italy
来源：
Surface Science Spectra | 2000年 / 7卷 / 02期
关键词：
Nanocrystals - Alumina - Aluminum oxide - X ray photoelectron spectroscopy - Chemical vapor deposition - Thin films;
D O I：
10.1116/1.1288177
中图分类号：
学科分类号：
摘要：
SnO2 nanocrystalline thin films are deposited on Al2O3 and SiO2/Si(100) by chemical vapor deposition starting from diethylaminodimethylstannane (IV) [(CH3)2Sn(N(C2H5)2)2]. X-ray photoelectron spectra of the principal core levels for the surface of a SnO2 film on SiO2/Si(100) are presented. © 2000 American Vacuum Society.
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页码：81 / 85
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