Electrical properties of LiNbO3 thin films by RF magnetron sputtering and bias sputtering

被引：0
|
作者：
Nishida, Takashi [1 ]
Shimizu, Masaru [1 ]
Horiuchi, Toshihisa [1 ]
Shiosaki, Tadashi [1 ]
Matsushige, Kazumi [1 ]
机构：
[1] Kyoto Univ, Kyoto, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 9 B期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
9
引用
收藏
页码：5113 / 5115
相关论文
共 50 条
  • [21] Preparation and Electrical Properties of BiFeO3 Films by RF Magnetron Sputtering
    Park, Sang Shik
    [J]. KOREAN JOURNAL OF MATERIALS RESEARCH, 2009, 19 (05): : 253 - 258
  • [22] Electrical properties of zirconium-rich PZT thin films by RF magnetron sputtering
    Wang, WS
    Fukui, M
    Fujii, T
    Karaki, T
    Adachi, M
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 35 : S1532 - S1536
  • [23] Optical and Electrical Properties of α-MnTe Thin Films Deposited Using RF Magnetron Sputtering
    Mori, Shunsuke
    Sutou, Yuji
    Ando, Daisuke
    Koike, Junichi
    [J]. MATERIALS TRANSACTIONS, 2018, 59 (09) : 1506 - 1512
  • [24] The properties of ZnO thin films fabricated by ion beam sputtering and RF magnetron sputtering
    He, X. X.
    Li, H. Q.
    Gu, J. B.
    Wu, S. B.
    Cao, B.
    [J]. THIN FILM PHYSICS AND APPLICATIONS, SIXTH INTERNATIONAL CONFERENCE, 2008, 6984
  • [25] Current-voltage characteristics and impedance spectroscopy of LiNbO3 films grown by RF magnetron sputtering
    Iyevlev, V.
    Sumets, M.
    Kostyuchenko, A.
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2012, 23 (04) : 913 - 920
  • [26] Sputtering condition effect on structure and properties of LiNbO3 films
    M. Sumets
    A. Kostyuchenko
    V. Ievlev
    S. Kannykin
    V. Dybov
    [J]. Journal of Materials Science: Materials in Electronics, 2015, 26 : 4250 - 4256
  • [27] Effects of sputtering power on properties of PbSe nanocrystalline thin films deposited by RF magnetron sputtering
    Feng, Wenran
    Wang, Xiaoyang
    Zhou, Hai
    Chen, Fei
    [J]. VACUUM, 2014, 109 : 108 - 111
  • [28] Sputtering condition effect on structure and properties of LiNbO3 films
    Sumets, M.
    Kostyuchenko, A.
    Ievlev, V.
    Kannykin, S.
    Dybov, V.
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2015, 26 (06) : 4250 - 4256
  • [29] Effects of sputtering pressure on properties of copper oxide thin films prepared by rf magnetron sputtering
    Darma, T. H.
    Ogwu, A. A.
    Placido, F.
    [J]. MATERIALS TECHNOLOGY, 2011, 26 (01) : 28 - 31
  • [30] Microstructure and Electrical Properties of AZO Films Prepared by RF Magnetron Sputtering
    Jufriadi
    Sutjipto, A. G. E.
    Othman, R.
    Muhida, R.
    [J]. ADVANCES IN MATERIALS AND PROCESSING TECHNOLOGIES II, PTS 1 AND 2, 2011, 264-265 : 754 - +
12345