Oxygen microwave plasma density enhancement by surface waves with a high-permittivity material window

被引：0
|
作者：
Furukawa, Masakazu [1 ,3 ]
Koromogawa, Takashi [2 ]
Kamiyo, Kouji [2 ]
Shinagawa, Keisuke [1 ]
Kawamura, Katsufumi [1 ]
Shindo, Haruo [2 ]
机构：
[1] Process Equipment Engineering Div., Canon Sales Co., Inc., 2-13-29 Kohnan, Minato-ku, Tokyo 108-0075, Japan
[2] Department of Applied Physics, Tokai University, 1117 Kitakaname, Hiratsuka 259-1292, Japan
[3] Optical Products Chief Executive Office, Canon Inc., 3-30-2 Simomaruko, Ohta-ku, Tokyo 146-8501, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 08期
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页码：4905 / 4909
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