Effects of applied magnetic fields on silicon oxide films formed by microwave plasma CVD

被引：0
|
作者：
Fukuda, Takuya [1 ]
Suzuki, Kazuo [1 ]
Takahashi, Shigeru [1 ]
Mochizuki, Yasuhiro [1 ]
Ohue, Michio [1 ]
Momma, Naohiro [1 ]
Sonobe, Tadashi [1 ]
机构：
[1] Hitachi Ltd, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 10期
关键词：
D O I：
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学科分类号：
摘要：
7
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页码：1962 / 1965
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