PREPARATION AND PROPERTIES OF AMORPHOUS BORON NITRIDE FILMS BY MOLECULAR FLOW CHEMICAL VAPOR DEPOSITION.

被引:0
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作者
Nakamura, Katsumitsu [1 ]
机构
[1] Nihon Univ, Dep of Chemistry, Tokyo,, Jpn, Nihon Univ, Dep of Chemistry, Tokyo, Jpn
来源
Journal of the Electrochemical Society | 1985年 / 132卷 / 07期
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All Open Access; Bronze;
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摘要
BORON COMPOUNDS
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页码:1757 / 1762
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