High-rate deposition of hydrogenated amorphous silicon films and devices

被引：0
|
作者：
Luft, Werner [1 ]
机构：
[1] Solar Energy Research Inst, United States
来源：
Applied physics communications | 1988年 / 8卷 / 04期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Semiconducting Silicon
引用
下载
收藏
页码：239 / 298
相关论文
共 50 条
  • [41] High-rate deposition of nano-crystalline silicon thin films on plastics
    Marins, E.
    Guduru, V.
    Ribeiro, M.
    Cerqueira, F.
    Bouattour, A.
    Alpuim, P.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 3, 2011, 8 (03): : 846 - 849
  • [42] ANNEALING EFFECT ON HYDROGENATED AMORPHOUS SILICON FILMS PREPARED AT HIGH DEPOSITION-RATE BY SUBSTRATE IMPEDANCE TUNING TECHNIQUE.
    Ueda, Masato
    Chayahara, Akiyoshi
    Nakashita, Toshio
    Imura, Takeshi
    Osaka, Yukio
    1600, (24):
  • [43] DEPOSITION AND PHOTOCONDUCTIVITY OF HYDROGENATED AMORPHOUS-SILICON FILMS BY THE PYROLYSIS OF DISILANE
    CHU, TL
    CHU, SS
    ANG, ST
    LO, DH
    DUONG, A
    HWANG, CG
    JOURNAL OF APPLIED PHYSICS, 1986, 59 (04) : 1319 - 1322
  • [44] PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS
    MUTSUKURA, N
    MACHI, Y
    APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1986, 41 (02): : 103 - 108
  • [45] MORPHOLOGY OF HYDROGENATED AMORPHOUS SILICON FILMS BY PHOTOCHEMICAL VAPOR DEPOSITION.
    Mutsukura, Nobuki
    Machi, Yoshio
    1600, (48):
  • [46] NOVEL TECHNIQUE FOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON THIN FILMS.
    Robertson, P.A.
    Milne, W.I.
    1600, (22):
  • [47] Degradation of hydrogenated amorphous silicon passivation films caused by sputtering deposition
    Meiners, Britt-Marie
    Borchert, Dietmar
    Hohage, Stefan
    Holinksi, Sven
    Schaefer, Petra
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2015, 212 (08): : 1817 - 1822
  • [48] The Influence of Deposition Pressure on the Properties of Hydrogenated Amorphous Silicon Thin Films
    Yuan Jun-bao
    Yang Wen
    Chen Xiao-bo
    Yang Pei-zhi
    Song Zhao-ning
    SPECTROSCOPY AND SPECTRAL ANALYSIS, 2016, 36 (02) : 326 - 330
  • [49] ION-BEAM DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS
    KASDAN, A
    GOSHORN, DP
    LANFORD, WA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 305 - 306
  • [50] Deposition of ultrapure hydrogenated amorphous silicon
    Kamei, T
    Matsuda, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (01): : 113 - 120
12345