MORPHOLOGY OF HYDROGENATED AMORPHOUS SILICON FILMS BY PHOTOCHEMICAL VAPOR DEPOSITION.

被引：0

作者：

Mutsukura, Nobuki ^{[1
]}

Machi, Yoshio ^{[1
]}

机构：

[1] Tokyo Denki Univ, Tokyo, Jpn, Tokyo Denki Univ, Tokyo, Jpn

来源：

| 1600年 / 48期

关键词：

PHOTOCHEMISTRY;

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暂无

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[1] MORPHOLOGY OF HYDROGENATED AMORPHOUS-SILICON FILMS BY PHOTOCHEMICAL VAPOR-DEPOSITION
MUTSUKURA, N
MACHI, Y
APPLIED PHYSICS LETTERS, 1986, 48 (08) : 544 - 545
[2] PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS
MUTSUKURA, N
MACHI, Y
APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1986, 41 (02): : 103 - 108
[3] Influence of nitrogen incorporation in hydrogenated amorphous silicon films prepared by photochemical vapor deposition
Hiramatsu, Masato, 1600, (30):
[4] HIGH-PERFORMANCE HYDROGENATED AMORPHOUS SILICON-GERMANIUM SOLAR CELLS FABRICATED BY PHOTOCHEMICAL VAPOR DEPOSITION.
Yamanaka, Satoshi
Yoshida, Shinichiro
Konagai, Makoto
Takahashi, Kiyoshi
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1987, 26 (07): : 1107 - 1111
[5] HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY MERCURY SENSITIZED PHOTOCHEMICAL VAPOR-DEPOSITION
KAMIMURA, T
NOZAKI, H
SAKUMA, N
NAKAJIMA, M
ITO, H
AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 : 51 - 56
[6] Selective deposition of a silicon film on hydrogenated amorphous silicon by mercury sensitized photochemical vapor deposition
Hiramatsu, Masato, 1600, Publ by JJAP, Minato-ku, Japan (32):
[7] EFFECT OF DEPOSITION PARAMETERS ON THE PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION
DE, A
RAY, S
BARUA, AK
SOLAR ENERGY MATERIALS, 1990, 20 (1-2): : 139 - 148
[8] INFLUENCE OF NITROGEN INCORPORATION IN HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION
HIRAMATSU, M
KAMIMURA, T
NAKAJIMA, M
ITO, H
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (1A): : L7 - L10
[9] PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS FROM HYDROGEN DILUTED MONOSILANE
MUTSUKURA, N
KATOH, Y
MACHI, Y
JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) : 3364 - 3366
[10] EFFECT OF HYDROGEN DILUTION OF SILANE IN HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION
KAMIMURA, T
HIROSE, M
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (12): : 1778 - 1782

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