MORPHOLOGY OF HYDROGENATED AMORPHOUS SILICON FILMS BY PHOTOCHEMICAL VAPOR DEPOSITION.

被引：0
|
作者：
Mutsukura, Nobuki [1 ]
Machi, Yoshio [1 ]
机构：
[1] Tokyo Denki Univ, Tokyo, Jpn, Tokyo Denki Univ, Tokyo, Jpn
来源：
| 1600年 / 48期
关键词：
PHOTOCHEMISTRY;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
下载
收藏
相关论文
共 50 条
  • [21] Smooth Surface Morphology of Hydrogenated Amorphous Silicon Film Prepared by Plasma Enhanced Chemical Vapor Deposition
    Yan Xu
    Feng Fei
    Zhang Jin
    Wang Yuelin
    PLASMA SCIENCE & TECHNOLOGY, 2009, 11 (05) : 569 - 575
  • [22] Smooth Surface Morphology of Hydrogenated Amorphous Silicon Film Prepared by Plasma Enhanced Chemical Vapor Deposition
    闫许
    冯飞
    张进
    王跃林
    Plasma Science and Technology, 2009, 11 (05) : 569 - 575
  • [23] Smooth surface morphology of hydrogenated amorphous silicon film prepared by plasma enhanced chemical vapor deposition
    State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
    不详
    Plasma Sci. Technol., 2009, 5 (569-575):
  • [24] PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS FROM DISILANE AND TRISILANE USING A LOW-PRESSURE MERCURY LAMP
    KUMATA, K
    ITOH, U
    TOYOSHIMA, Y
    TANAKA, N
    ANZAI, H
    MATSUDA, A
    APPLIED PHYSICS LETTERS, 1986, 48 (20) : 1380 - 1382
  • [25] Hydrogenated amorphous silicon films grown by pulsed laser deposition
    Kandyla, M.
    Mellos, A.
    Kompitsas, M.
    2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS EUROPE AND INTERNATIONAL QUANTUM ELECTRONICS CONFERENCE (CLEO EUROPE/IQEC), 2013,
  • [26] Spectroscopic ellipsometry studies on ultrathin hydrogenated amorphous silicon films prepared by thermal chemical vapor deposition
    Hazra, Sukti
    Yamanaka, Mitsuyuki
    Sakata, Isao
    Tsutsumi, Toshiyuki
    Maeda, Tatsuro
    Suzuki, Eiichi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2000, 39 (11): : 6196 - 6201
  • [27] Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition
    Yang, Shiguo
    Wen, Guozhi
    Luo, Yang
    Liang, Yi
    PROCEEDINGS OF THE 2015 4TH INTERNATIONAL CONFERENCE ON SUSTAINABLE ENERGY AND ENVIRONMENTAL ENGINEERING, 2016, 53 : 755 - 758
  • [28] DOPED HYDROGENATED AMORPHOUS-SILICON FILMS BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION
    BRANZ, HM
    FAN, S
    FLINT, JH
    FISKE, BT
    ADLER, D
    HAGGERTY, JS
    APPLIED PHYSICS LETTERS, 1986, 48 (02) : 171 - 173
  • [29] Spectroscopic ellipsometry studies on ultrathin hydrogenated amorphous silicon films prepared by thermal chemical vapor deposition
    Harza, S
    Yamanaka, M
    Sakata, I
    Tsutsumi, T
    Maeda, T
    Suzuki, E
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (11): : 6196 - 6201
  • [30] LOW DEFECT-DENSITY HYDROGENATED AMORPHOUS-SILICON FILMS BY CHEMICAL VAPOR-DEPOSITION
    CHU, TL
    CHU, SS
    ANG, ST
    BYLANDER, EG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (11) : C626 - C626
12345