Characterization of interface of c-BN film deposited on silicon(100) substrate

被引：0
|
作者：
Tian, Jingze [1 ]
Xia, Lifang [1 ]
Ma, Xinxin [1 ]
Sun, Yue [1 ]
Byon, Eung-Sun [2 ]
Lee, Sung-Hun [2 ]
Lee, Sang-Ro [2 ]
机构：
[1] Sch. of Mat. Science and Technology, P.O. Box 433, Harbin Inst. T., Harbin, China
[2] Korea Inst. of Mach. and Material, Seoul, Korea, Republic of
来源：
Thin Solid Films | 1999年 / 355卷
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页码：229 / 232
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