LASER BEAM DEFOCUSING AT 1. 06 mu m BY CARRIER EXCITATION IN SILICON.

被引:0
|
作者
Chen Jun [1 ]
Eichler, H.-J. [1 ]
机构
[1] Technische Univ Berlin, Berlin, West Ger, Technische Univ Berlin, Berlin, West Ger
来源
关键词
LASERS; SOLID STATE - SEMICONDUCTING SILICON - Charge Carriers;
D O I
暂无
中图分类号
学科分类号
摘要
Laser beams from a 15 ns pulsed Nd:YAG laser are defocused after passing silicon crystals with 400 mu m thickness. The beam profile changes into a ring structure at incident laser energies up to 30 mJ and energy densities of 440 mJ/cm**2. The experimental deflection angles agree with calculations assuming refractive index changes due to electron-hole pairs produced by interband absorption.
引用
收藏
页码:121 / 124
相关论文
共 50 条
  • [31] SPECTRAL PROPERTIES OF STRONGLY COUPLED 1. 5 mu M DFB LASER DIODES.
    Westbrook, Leslie D.
    Henning, I.D.
    Nelson, Andrew W.
    Fiddyment, Philip J.
    IEEE Journal of Quantum Electronics, 1984, QE-21 (06) : 512 - 518
  • [32] 1. 3 mu m InGaAsP/InP MULTIQUANTUM WELL LASER GROWN BY LPE.
    Sasai, Yoichi
    Hase, Nobuyasu
    Kajiwara, Takao
    Japanese Journal of Applied Physics, Part 2: Letters, 1985, 24 (02): : 137 - 139
  • [33] LASER PROCESSING OF SEMICONDUCTOR SILICON .1.
    MAGEE, TJ
    MCNAB, TK
    SOLID STATE TECHNOLOGY, 1982, 25 (07) : 74 - 82
  • [34] SINGLE-CRYSTAL SILICON: A NEW MATERIAL FOR 1. 3 AND 1. 6 mu m INTEGRATED-OPTICAL COMPONENTS.
    Soref, R.A.
    Lorenzo, J.P.
    1600, (21):
  • [35] INFLUENCE OF CHARGE-TRANSFER BETWEEN SHALLOW IMPURITIES ON DEFOCUSING OF A LASER-BEAM IN SILICON-CRYSTALS
    BALTRAMEYUNAS, R
    VELETSKAS, D
    SKAISTIS, E
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1989, 23 (07): : 759 - 762
  • [36] EPR STUDY OF Si-S1-CENTER OPTICAL EXCITATION AND RELAXATION PROCESSES IN IRRADIATED SILICON.
    Vlasenko, L.S.
    Zaritskii, I.M.
    Konchits, A.A.
    Shanina, B.D.
    Soviet Physics, Solid State (English translation of Fizika Tverdogo Tela), 1984, 26 (01): : 66 - 69
  • [37] OPTICAL MULTISTABILITY IN SILICON OBSERVED WITH A CW LASER AT 1.06-MU-M
    EICHLER, HJ
    OPTICS COMMUNICATIONS, 1983, 45 (01) : 62 - 66
  • [38] COMPUTER-SIMULATION OF LASER ANNEALING SILICON AT 1.06 MU-M
    SCHULTZ, JC
    COLLINS, RJ
    APPLIED PHYSICS LETTERS, 1979, 34 (01) : 84 - 87
  • [39] SINGLE-MODE CW 1. 5 mu m RIDGE-WAVEGUIDE LASER.
    Kaminow, I.P.
    Nahory, R.E.
    Pollack, M.A.
    Stulz, L.W.
    DeWinter, J.C.
    1979, : 1 - 16
  • [40] RECOMBINATION, GAIN AND BANDWIDTH CHARACTERISTICS OF 1. 3- mu M SEMICONDUCTOR LASER AMPLIFIERS.
    Wang, Jinwei
    Olesen, Henning
    Stubkjaer, Kristian E.
    Journal of Lightwave Technology, 1987, LT-5 (01) : 184 - 189