Mechanism of ion-beam etching of organic resists by inert-gas ions

被引：0
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作者：
Koval, Yu.I. [1 ]
Borzenko, T.B. [1 ]
Kudryashov, V.A. [1 ]
机构：
[1] Russian Acad of Sciences, Chernogolovka, Russia
来源：
Physics, chemistry and mechanics of surfaces | 1995年 / 10卷 / 10-11期
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页码：1265 / 1271
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