Control of ion energy for low-damage plasma processing in RF discharge

被引：0
|
作者：
Sato, Naoyuki [1 ]
Kobayashi, Hideki [1 ]
Tanabe, Toshio [1 ]
Ikehata, Takashi [1 ]
Mase, Hiroshi [1 ]
机构：
[1] Ibaraki Univ, Hitachi, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 4 B期
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页码：2158 / 2162
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