Growth and properties of InAsP alloys prepared by organometallic vapor phase epitaxy

被引:0
|
作者
Huang, K.H. [1 ]
Wessels, B.W. [1 ]
机构
[1] Northwestern Univ, United States
来源
Journal of Crystal Growth | 1600年 / 92卷 / 3-4期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Semiconducting Indium Compounds
引用
收藏
页码:547 / 552
相关论文
共 50 条
  • [41] Ligand exchange reactions in organometallic vapor phase epitaxy
    Kappers, MJ
    Warddrip, ML
    Wilkerson, KJ
    Hicks, RF
    JOURNAL OF ELECTRONIC MATERIALS, 1997, 26 (10) : 1169 - 1173
  • [42] Metal organic vapor phase epitaxy of InAsP/InP(001) quantum dots for 1.55 μm applications:: Growth, structural, and optical properties
    Michon, A.
    Hostein, R.
    Patriarche, G.
    Gogneau, N.
    Beaudoin, G.
    Beveratos, A.
    Robert-Philip, I.
    Laurent, S.
    Sauvage, S.
    Boucaud, P.
    Sagnes, I.
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (04)
  • [43] Photoluminescent properties of undoped GaN prepared by atmospheric vapor phase epitaxy
    Yi, GC
    Wessels, BW
    ICDS-18 - PROCEEDINGS OF THE 18TH INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS, PTS 1-4, 1995, 196- : 49 - 53
  • [44] Photoluminescence properties of undoped GaN prepared by atmospheric vapor phase epitaxy
    Yi, Gyu-Chul
    Wessels, Bruce W.
    Materials Science Forum, 1995, 196-201 (pt 1): : 49 - 54
  • [45] Growth mechanism in the multiple buffer layer of GaN on sapphire by organometallic vapor phase epitaxy
    Yang, CC
    Wu, MC
    Hung, YC
    Chi, GC
    STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS XXXI), 1999, 99 (17): : 20 - 24
  • [46] Atmospheric pressure growth of Eu-doped GaN by organometallic vapor phase epitaxy
    Furukawa, Naoki
    Nishikawa, Atsushi
    Kawasaki, Takashi
    Terai, Yoshikazu
    Fujiwara, Yasufumi
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2011, 208 (02): : 445 - 448
  • [47] GROWTH OF ULTRAPURE INP BY ATMOSPHERIC-PRESSURE ORGANOMETALLIC VAPOR-PHASE EPITAXY
    CHEN, CH
    KITAMURA, M
    COHEN, RM
    STRINGFELLOW, GB
    APPLIED PHYSICS LETTERS, 1986, 49 (15) : 963 - 965
  • [48] LATTICE MISMATCHED HETEROEPITAXIAL GROWTH OF GAAS ON INP BY ORGANOMETALLIC VAPOR-PHASE EPITAXY
    CHAKRABARTI, UK
    HOBSON, WS
    SWAMINATHAN, V
    PEARTON, SJ
    NAKAHARA, S
    SCHNOES, ML
    THOMAS, PM
    FIRST INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS FOR ADVANCED ELECTRONIC AND OPTICAL DEVICES, 1989, 1144 : 69 - 77
  • [49] INITIAL GROWTH OF GALLIUM-ARSENIDE ON SILICON BY ORGANOMETALLIC VAPOR-PHASE EPITAXY
    ROSNER, SJ
    AMANO, J
    LEE, JW
    FAN, JCC
    APPLIED PHYSICS LETTERS, 1988, 53 (12) : 1101 - 1103
  • [50] SELECTIVE GROWTH OF GAAS BY ORGANOMETALLIC VAPOR-PHASE EPITAXY AT ATMOSPHERIC-PRESSURE
    AZOULAY, R
    DUGRAND, L
    APPLIED PHYSICS LETTERS, 1991, 58 (02) : 128 - 130