Influences of various metal elements on field aided lateral crystallization of amorphous silicon films

被引：0
|
作者：
Lee, Jae-Bok [1 ]
Lee, Chan-Jae [2 ]
Choi, Duck-Kyun [1 ]
机构：
[1] Department of Ceramic Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul 133-791, Korea, Republic of
[2] Electronics Devices Research Center, Korea Electronics Technology Institue, San No. 455-6, Masan-Ri, Jinwi-Myon, Pyuntaek-Si, Kyungki-Do 451-860, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2001年 / 40卷 / 11期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：6177 / 6181
相关论文
共 50 条
  • [21] Dopant effect on in situ doped metal-induced lateral crystallization of amorphous silicon films
    Hwang, JD
    Chang, JY
    Wu, CY
    APPLIED SURFACE SCIENCE, 2005, 249 (1-4) : 65 - 70
  • [22] In situ observation of nickel metal-induced lateral crystallization of amorphous silicon thin films
    Miyasaka, M
    Makihira, K
    Asano, T
    Polychroniadis, E
    Stoemenos, J
    APPLIED PHYSICS LETTERS, 2002, 80 (06) : 944 - 946
  • [23] TCAD modeling of metal induced lateral crystallization of amorphous silicon
    Agapov, AM
    Kalinin, VV
    Myasnikov, AM
    Poon, VMC
    Vermeire, B
    Amorphous and Nanocrystalline Silicon Science and Technology-2005, 2005, 862 : 251 - 256
  • [24] Effect of electric field on amorphous silicon thin films during Ni induced lateral crystallization
    Ahn, Ji-Su
    Kim, Deok-Kee
    Joo, Seung-Ki
    JOURNAL OF APPLIED PHYSICS, 2013, 113 (22)
  • [25] Directional nickel-induced fielded aided lateral crystallization of amorphous silicon
    Izmajlowicz, MAT
    Flewitt, AJ
    Milne, WI
    Morrison, NA
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (12) : 7535 - 7541
  • [26] Effect of electric field on doped amorphous silicon thin films during Ni induced lateral crystallization
    Ahn, Ji-Su
    Kim, Deok-kee
    Joo, Seung-Ki
    MATERIALS LETTERS, 2013, 93 : 233 - 236
  • [27] CRYSTALLIZATION OF AMORPHOUS SILICON FILMS
    KOSTER, U
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1978, 48 (02): : 313 - 321
  • [28] Crystallization of amorphous hydrogenated silicon films deposited under various conditions
    Golikova, OA
    Bogdanova, EV
    Babakhodzhaev, US
    SEMICONDUCTORS, 2002, 36 (10) : 1180 - 1183
  • [29] Crystallization of amorphous hydrogenated silicon films deposited under various conditions
    O. A. Golikova
    E. V. Bogdanova
    U. S. Babakhodzhaev
    Semiconductors, 2002, 36 : 1180 - 1183
  • [30] Metal induced lateral crystallization of amorphous silicon through a silicon nitride cap layer
    Choi, JH
    Kim, DY
    Choo, BK
    Sohn, WS
    Jang, J
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2003, 6 (01) : G16 - G18
12345