Erratum: (Photomask and Next-Generation Lithography Mask Technology IX (23-25 April 2002))

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| 1600年 / PMJ-Photomask Japan; BACUS-intl. technical group of SPIE; SPIE卷 / The International Society for Optical Engineering期

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[21] Genotyping of 25 leukemia-associated genes in a single workflow by next-generation sequencing technology
Rinke, J.
Schaefer, V
Ziermann, J.
Dornaus, S.
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ONKOLOGIE, 2012, 35 : 17 - 17
[22] SPECIAL ISSUE - PROCEEDINGS OF THE INTERNATIONAL-SYMPOSIUM ON WINDSHIP TECHNOLOGY, WINDTECH-85, SOUTHAMPTON, UK, APRIL 23-25, 1985 - PREFACE
SATCHWELL, CJ
JOURNAL OF WIND ENGINEERING AND INDUSTRIAL AERODYNAMICS, 1985, 20 (1-3) : R6 - R6
[23] Potential of the FLASH free electron laser technology for the construction of a kW-scale light source for next-generation lithography
Schneidmiller, Evgeny A.
Vogel, Vladimir F.
Weise, Hans
Yurkov, Mikhail V.
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
[24] Opening remarks at the Next Generation Nucleon Decay and Neutrino Detector Workshop (NNN99) - State University of New York at Stonybrook, Sep. 23-25, 1999
Goldhaber, M
NEXT GENERATION NUCLEON DECAY AND NEUTRINO DETECTOR, 2000, 533 : 3 - 5
[25] GENOTYPING OF 25 LEUKEMIA-ASSOCIATED GENES IN A SINGLE WORKFLOW BY NEXT-GENERATION SEQUENCING TECHNOLOGY USING LOW AMOUNTS OF INPUT TEMPLATE DNA
Ernst, T.
Rinke, J.
Schaefer, V.
Schmidt, M.
Ziermann, J.
Kohlmann, A.
Hochhaus, A.
HAEMATOLOGICA, 2013, 98 : 394 - 394
[26] Genotyping of 25 Leukemia-Associated Genes in a Single Work Flow by Next-Generation Sequencing Technology with Low Amounts of Input Template DNA
Rinke, Jenny
Schaefer, Vivien
Schmidt, Mathias
Ziermann, Janine
Kohlmann, Alexander
Hochhaus, Andreas
Ernst, Thomas
CLINICAL CHEMISTRY, 2013, 59 (08) : 1238 - 1250
[27] Toward next-generation cancer immunotherapy: 10th Annual Meeting of the Association for Cancer Immunotherapy (CIMT), Mainz, Germany, May 23–25, 2012
Björn-Philipp Kloke
Sarah Kutscher
Richard Rae
Pia Kvistborg
Cedrik M. Britten
Sine Reker Hadrup
Cancer Immunology, Immunotherapy, 2013, 62 : 975 - 981
[28] EUV edging out rivals as next-generation IC fab tool - Once an outsider, extreme ultraviolet lithography is now on the inside tract (vol 38, pg 25, 2001)
Roush, W
IEEE SPECTRUM, 2001, 38 (08) : 12 - 12
[29] 1ST EUROPEAN WIND ENERGY CONFERENCE, HAMBURG, FEDERAL-REPUBLIC-OF-GERMANY, 22-26 OCTOBER 1984 - 7TH BWEA CONFERENCE, OXFORD, UK, 27-29 MARCH 1985 - WINDTECH 85 INTERNATIONAL-SYMPOSIUM ON WINDSHIP TECHNOLOGY, SOUTHAMPTON, UK, 23-25 APRIL 1985
CONWAY, A
ENERGY POLICY, 1985, 13 (04) : 404 - 405

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