Potential of the FLASH free electron laser technology for the construction of a kW-scale light source for next-generation lithography

被引：12
|
作者：
Schneidmiller, Evgeny A. [1 ]
Vogel, Vladimir F. [1 ]
Weise, Hans [1 ]
Yurkov, Mikhail V. [1 ]
机构：
[1] Deutsch Elektronen Synchrotron DESY, D-22607 Hamburg, Germany
来源：
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2012年 / 11卷 / 02期
关键词：
free electron laser; lithography; next-generation lithography; coherence; vacuum ultraviolet radiation; soft X-ray radiation; X-ray laser; AMPLIFIED SPONTANEOUS-EMISSION; EXTREME-ULTRAVIOLET; DESIGN CONSIDERATIONS; MULTILAYER OPTICS; SASE FEL; RADIATION; WAVELENGTH; OPERATION; POWER; GAIN;
D O I：
10.1117/1.JMM.11.2.021122
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The driving engine of the free electron laser in Hamburg (FLASH) is an L-band superconducting accelerator. It is designed to operate in burst mode with an 800-ms pulse duration at a repetition rate of 10 Hz. The maximum accelerated beam current during the macropulse is 9 mA. Our analysis shows that the FLASH technology has great potential since it is possible to construct a FLASH-like free electron laser operating at the wavelength of 13.5 and 6.8 nm with an average power of up to 2.6 kW. Such a source meets the physical requirements for the light source for next-generation lithography. (c) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.JMM.11.2.021122]
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页数：9
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