Preparation of X-ray laser germanium film targets

被引：0
|
作者：
Xu, Hua [1 ]
Cui, Baoshun [1 ]
Zhao, Chaokang [1 ]
Wang, Mingda [1 ]
Zhuo, Zhiyun [1 ]
Chang, Fuhua [1 ]
Cheng, Zhimei [1 ]
Lou, Qiaoya [1 ]
机构：
[1] Southwest Inst of Nuclear Physics, and Chemistry, Chengdu, China
来源：
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 1996年 / 8卷 / 01期
关键词：
Germanium - Magnetron sputtering - Optical films - Sputter deposition - Targets;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The preparation of the X-ray laser germanium film targets has been presented. The germanium film with 30-60 nm thickness was coated on a 90 nm thickness Formvar film using radio-frequency magnetron sputtering technology. The qualities of the germanium film targets accord with the experimental demands by the Leitz interference microscope measurement.
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页码：78 / 82
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