Preparation of X-ray laser germanium film targets

被引：0

作者：

Xu, Hua ^{[1
]}

Cui, Baoshun ^{[1
]}

Zhao, Chaokang ^{[1
]}

Wang, Mingda ^{[1
]}

Zhuo, Zhiyun ^{[1
]}

Chang, Fuhua ^{[1
]}

Cheng, Zhimei ^{[1
]}

Lou, Qiaoya ^{[1
]}

机构：

[1] Southwest Inst of Nuclear Physics, and Chemistry, Chengdu, China

来源：

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 1996年 / 8卷 / 01期

关键词：

Germanium - Magnetron sputtering - Optical films - Sputter deposition - Targets;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The preparation of the X-ray laser germanium film targets has been presented. The germanium film with 30-60 nm thickness was coated on a 90 nm thickness Formvar film using radio-frequency magnetron sputtering technology. The qualities of the germanium film targets accord with the experimental demands by the Leitz interference microscope measurement.

引用

页码：78 / 82

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