Deep X-ray lithography with a tunable wavelength shifter at CAMD

被引：0
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作者：
Malek, C. Khan [1 ]
Saile, V. [1 ]
Manohara, H. [1 ]
Craft, B. [1 ]
机构：
[1] Ctr. Adv. Microstructures Devices, Louisiana State University, 3990 West Lakeshore Drive, Baton Rouge, LA 70803, United States
来源：
Journal of Synchrotron Radiation | 1998年 / 5卷 / 03期
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页码：1095 / 1098
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