Mo/Si and Mo/Be multilayer thin films on zerodur substrates for extreme-ultraviolet lithography

被引：0
|
作者：
Mirkarimi, Paul B. [1 ]
Bajt, Sasa [1 ]
Wall, Mark A. [1 ]
机构：
[1] Lawrence Livermore Natl. Laboratory, Mail Stop L-395, 7000 East Avenue, Livermore, CA 94550, United States
来源：
Applied Optics | 2000年 / 39卷 / 10期
关键词：
D O I：
10.1364/ao.39.001617
中图分类号：
学科分类号：
摘要：
Lithography
引用
收藏
页码：1617 / 1625
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