X-RAY PHOTOELECTRON SPECTROSCOPY OF THERMALLY TREATED SiO2 SURFACES.
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作者:
Miller, Mark L.
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Univ of North Carolina, Dep of, Chemistry, Chapel Hill, NC, USA, Univ of North Carolina, Dep of Chemistry, Chapel Hill, NC, USAUniv of North Carolina, Dep of, Chemistry, Chapel Hill, NC, USA, Univ of North Carolina, Dep of Chemistry, Chapel Hill, NC, USA
Miller, Mark L.
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Linton, Richard W.
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Univ of North Carolina, Dep of, Chemistry, Chapel Hill, NC, USA, Univ of North Carolina, Dep of Chemistry, Chapel Hill, NC, USAUniv of North Carolina, Dep of, Chemistry, Chapel Hill, NC, USA, Univ of North Carolina, Dep of Chemistry, Chapel Hill, NC, USA
Linton, Richard W.
[1
]
机构:
[1] Univ of North Carolina, Dep of, Chemistry, Chapel Hill, NC, USA, Univ of North Carolina, Dep of Chemistry, Chapel Hill, NC, USA