Models of Conductivity of Thin Polycrystalline Silicon Films.

被引：0
|
作者：
Pawlak, Edmund Z. [1 ]
机构：
[1] Politechnika Warszawska, Pol, Politechnika Warszawska, Pol
来源：
| 1600年 / 33期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
SEMICONDUCTING SILICON
引用
收藏
相关论文
共 50 条
  • [1] Growth Kinetics and Properties of Thin Highly Doped Polycrystalline Silicon Films.
    Koleshko, V.M.
    Kovalevskii, A.A.
    Kaloshkin, E.P.
    Ryzhikova, N.E.
    Izvestiya Akademii Nauk SSSR, Neorganicheskie Materialy, 1977, 13 (06): : 941 - 945
  • [2] EXPERIMENTAL CHARACTERIZATION OF ELECTRICAL CONDUCTION IN UNDOPED POLYCRYSTALLINE SILICON THIN FILMS.
    Kim, Dae M.
    Qian, Feng
    Ahmed, S.S.
    Park, H.K.
    Sachitano, J.L.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1987, 26 (06): : 863 - 867
  • [3] CONDUCTIVITY OF BORON-IMPLANTED POLYCRYSTALLINE THIN SILICON FILMS
    MANSOUR, F
    BOUCHEMAT, M
    BOUKEZZATA, M
    TOUIDJEN, NH
    BIELLEDASPET, D
    MIROUH, K
    THIN SOLID FILMS, 1995, 261 (1-2) : 12 - 17
  • [4] Instability of polycrystalline thin films. Experiment and theory
    Miller, K.T.
    Lange, F.F.
    Marshall, D.B.
    Journal of Materials Research, 1990, 5 (01): : 151 - 160
  • [5] NONLINEAR CONDUCTIVITY OF THIN SEMICONDUCTOR FILMS.
    Romanov, Yu.A.
    Demidov, E.V.
    Soviet physics. Semiconductors, 1980, 14 (08): : 906 - 908
  • [6] Effect of Structure on the Electric Conductivity of Polycrystalline PbTe Films.
    Bratashevskii, Yu.A.
    Samoilenko, Z.A.
    Okunev, U.D.
    1600, (21):
  • [7] Modeling of agglomeration in polycrystalline thin films. Application to TiSi2 on a silicon substrate
    1600, (71):
  • [8] Pulsed laser deposition of polycrystalline zirconia thin films.
    Hanus, F
    Laude, LD
    ALT '97 INTERNATIONAL CONFERENCE ON LASER SURFACE PROCESSING, 1998, 3404 : 17 - 21
  • [9] METHOD OF DETERMINING THERMAL CONDUCTIVITY OF THIN FILMS.
    Boikov, Yu.A.
    Gol'tsman, B.M.
    Sinenko, S.F.
    Instruments and Experimental Techniques (English Translation of Pribory I Tekhnika Eksperimenta), 1975, 18 (2 pt 2): : 617 - 619
  • [10] PHOTOELECTRIC PROPERTIES OF AMORPHOUS SILICON THIN FILMS.
    Nakaue, Akimitsu
    Kajikawa, Hiroshi
    Ohnishi, Yoshihiko
    Hirai, Yo
    R and D: Research and Development Kobe Steel Engineering Reports, 1988, 38 (02): : 69 - 72
12345