Preparation of fluorinated amorphous carbon thin films

被引：0
|
作者：
Yokomichi, Haruo [1 ]
Hayashi, Tohru [1 ]
Amano, Tomihiro [1 ]
Masuda, Atsushi [1 ]
机构：
[1] Toyama Prefectural Univ, Toyama, Japan
来源：
Journal of Non-Crystalline Solids | / 227-230卷 / Pt A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：641 / 644
相关论文
共 50 条
  • [21] Oxidation of Fluorinated Amorphous Carbon (a-CFx) Films
    Yun, Yang
    Broitman, Esteban
    Gellman, Andrew J.
    LANGMUIR, 2010, 26 (02) : 908 - 914
  • [22] Temperature stability of fluorinated amorphous hydrogenated carbon films
    Muller, U
    Hauert, R
    Oral, B
    Tobler, M
    SURFACE & COATINGS TECHNOLOGY, 1995, 76 (1-3): : 367 - 371
  • [23] Characterization of amorphous carbon thin films
    Capano, MA
    McDevitt, NT
    Singh, RK
    Qian, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (02): : 431 - 435
  • [24] On the structure of thin amorphous carbon films
    Ossi, PM
    Miotello, A
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 2002, 82 (05): : 561 - 571
  • [25] Patterning with Amorphous Carbon Thin Films
    Antonelli, G. A.
    Reddy, S.
    Subramonium, P.
    Henri, J.
    Sims, J.
    O'loughlin, J.
    Shamma, N.
    Schlosser, D.
    Mountsier, T.
    Guo, W.
    Sawin, H.
    SILICON NITRIDE, SILICON DIOXIDE, AND EMERGING DIELECTRICS 11, 2011, 35 (04): : 701 - 716
  • [26] Characterization of amorphous carbon thin films
    Capano, M.A.
    McDevitt, N.T.
    Singh, R.K.
    Qian, F.
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1996, 14 (02):
  • [27] Fluorinated amorphous carbon thin films: Analysis of the role of the plasma source frequency on the structural and optical properties
    Valentini, L
    Braca, E
    Kenny, JM
    Lozzi, L
    Santucci, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (05): : 2168 - 2173
  • [28] Changes in structure and nature of defects by annealing of fluorinated amorphous carbon thin films with low dielectric constant
    Yokomichi, H
    Hayashi, T
    Masuda, A
    APPLIED PHYSICS LETTERS, 1998, 72 (21) : 2704 - 2706
  • [29] Effect of C=C content on I-V characteristics of fluorinated amorphous carbon thin films
    Chao, Y
    Ning, ZY
    Cheng, SH
    Yu, X
    Xu, SH
    ACTA PHYSICA SINICA, 2004, 53 (05) : 1496 - 1500
  • [30] Controlling fluorine concentration of fluorinated amorphous carbon thin films for low dielectric constant interlayer dielectrics
    Endo, K
    Tatsumi, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (11B): : L1531 - L1533
12345