Optical characterization of surface roughness of diamond by spectroscopic ellipsometry

被引：0
|
作者：
机构：
[1] Kumagai, N.
[2] Yamasaki, S.
[3] Okushi, H.
来源：
Kumagai, N. (nkumagai@iis.u-tokyo.ac.jp) | / Elsevier Ltd期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Characterization of pulsed-laser deposited amorphous diamond films by spectroscopic ellipsometry
    Jellison, GE
    Geohegan, DB
    Lowndes, DH
    Puretzky, AA
    Merkulov, VI
    ADVANCES IN LASER ABLATION OF MATERIALS, 1998, 526 : 349 - 354
  • [22] Spectroscopic Ellipsometry of Nanocrystalline Diamond Film Growth
    Thomas, Evan L. H.
    Mandal, Soumen
    Ashek-I-Ahmed
    Macdonald, John Emyr
    Dane, Thomas G.
    Rawle, Jonathan
    Cheng, Chia-Liang
    Williams, Oliver A.
    ACS OMEGA, 2017, 2 (10): : 6715 - 6727
  • [23] INVESTIGATION OF EFFECTIVE-MEDIUM MODELS OF MICROSCOPIC SURFACE-ROUGHNESS BY SPECTROSCOPIC ELLIPSOMETRY
    ASPNES, DE
    THEETEN, JB
    PHYSICAL REVIEW B, 1979, 20 (08): : 3292 - 3302
  • [24] Surface roughness and optical contact characterization of transparent prisms using frustrated total internal reflection tunneling ellipsometry
    Azzam, R. M. A.
    THIN SOLID FILMS, 2014, 571 : 666 - 668
  • [25] Optical properties of amorphous diamond films evaluated by non-destructive spectroscopic ellipsometry
    Zhu, JQ
    Han, JC
    Han, X
    Meng, SH
    Liu, AP
    He, XD
    OPTICAL MATERIALS, 2006, 28 (05) : 473 - 479
  • [26] Spectroscopic Ellipsometry of Surface Plasmons
    Budai, J.
    Papa, Z.
    Csontos, J.
    Dombi, P.
    2019 CONFERENCE ON LASERS AND ELECTRO-OPTICS EUROPE & EUROPEAN QUANTUM ELECTRONICS CONFERENCE (CLEO/EUROPE-EQEC), 2019,
  • [27] THE CHARACTERIZATION OF MATERIALS BY SPECTROSCOPIC ELLIPSOMETRY
    ASPNES, DE
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 452 : 60 - 70
  • [28] FDTD-Based Study on Equivalent Medium Approximation Model of Surface Roughness for Thin Films Characterization Using Spectroscopic Ellipsometry
    Yu, Wanpei
    Cui, Changcai
    Li, Huihui
    Bian, Subiao
    Chen, Xi
    PHOTONICS, 2022, 9 (09)
  • [29] Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers
    Li, WJ
    Song, ZR
    Tao, K
    Cheng, XH
    Yang, WW
    Yu, YH
    Wang, X
    Zou, SC
    Shen, DS
    THIN SOLID FILMS, 2004, 459 (1-2) : 63 - 66
  • [30] Roughness Analysis of the Critical Dimension by Using Spectroscopic Ellipsometry
    Ghong, T. H.
    Han, S. -H.
    Chung, J. -M.
    Byun, J. S.
    Kim, Y. D.
    Aspnes, D. E.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2011, 58 (05) : 1426 - 1428
12345