MASK MAKING FOR SYNCHROTRON RADIATION LITHOGRAPHY.

被引：17
|
作者：
Ehrfeld, W. [1 ]
Glashauser, W. [1 ]
Muenchmeyer, D. [1 ]
Schelb, W. [1 ]
机构：
[1] Kernforschungszentrum Karlsruhe, Karlsruhe, West Ger, Kernforschungszentrum Karlsruhe, Karlsruhe, West Ger
来源：
Microelectronic Engineering | 1986年 / 5卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(86)90078-X
中图分类号：
学科分类号：
摘要：
3
引用
收藏
页码：463 / 470
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