Synchrotron Radiation Lithography and MEMS Technique at NSRL

被引：0
|
作者：
LIU Gang
机构：
来源：
光学精密工程 | 2001年 / 05期
关键词：
synchrotron radiation lithography(SRL); MEMS; microreactors;
D O I：
暂无
中图分类号：
TL544 [];
学科分类号：
082701 ;
摘要：
Two beamlines and stations for soft X-ray lithography and hard X-ray lithography at NSRL are presented. Synchrotron radiation lithography (SRL) and mask techniques are developed, and the micro-electro-mechanical systems (MEMS) techniques are also investigated at NSRL. In this paper, some results based on SRL and MEMS techniques are reported, and sub-micron and high aspect ratio microstructures are given. Some micro-devices, such as microreactors are fabricated at NSRL.
引用
收藏
页码：455 / 457
页数：3
相关论文
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