Inductively coupled plasma etching of III-V semiconductors in Cl2-based chemistries

被引：0
|
作者：
Lee, J.W. [1 ]
Lambers, E.S. [1 ]
Abernathy, C.R. [1 ]
Pearton, S.J. [1 ]
Shul, R.J. [1 ]
Ren, F. [1 ]
Hobson, W.S. [1 ]
Constantine, C. [1 ]
机构：
[1] Univ of Florida, Gainesville, United States
来源：
Materials Science in Semiconductor Processing | 1998年 / 1卷 / 01期
关键词：
The work at UF is partially supported by a DOD MURI monitored by AFOSR (H.C. DeLong); contract No. F49620-96-1-0026. Sandia National Laboratories is a multi-program laboratory operated by Martin Marietta for the US Department of Energy under Contract No. DE-AC04-94AL85000;
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摘要：
28
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页码：65 / 73
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