DOWNSTREAM PLASMA ACTIVATED ETCHING OF III-V COMPOUND SEMICONDUCTORS

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作者：
IYER, R
LILE, DL
机构：
来源：
ADVANCES IN MATERIALS, PROCESSING AND DEVICES IN III-V COMPOUND SEMICONDUCTORS | 1989年 / 144卷
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中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
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页码：519 / 524
页数：6
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