Macrocrystalline Ge thin films prepared by remote plasma CVD from tetraethylgermanium

被引：0
|
作者：
Aoki, T. [1 ]
Ogishima, T. [1 ]
Nakanishi, Y. [1 ]
Hatanaka, Y. [1 ]
Tyczkowski, J. [2 ]
机构：
[1] Graduate School of Electronic Science and Technology, Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
[2] Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, 90-363 Lódź, Poland
来源：
Journal of Wide Bandgap Materials | 1998年 / 6卷 / 03期
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页码：196 / 208
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