Macrocrystalline Ge thin films prepared by remote plasma CVD from tetraethylgermanium

被引：0
|
作者：
Aoki, T. [1 ]
Ogishima, T. [1 ]
Nakanishi, Y. [1 ]
Hatanaka, Y. [1 ]
Tyczkowski, J. [2 ]
机构：
[1] Graduate School of Electronic Science and Technology, Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
[2] Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, 90-363 Lódź, Poland
来源：
Journal of Wide Bandgap Materials | 1998年 / 6卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：196 / 208
相关论文
共 50 条
  • [21] SILICON-NITRIDE THIN-FILMS PREPARED BY ELECTRON-CYCLOTRON RESONANCE PLASMA CVD
    MANABE, Y
    MITSUYU, T
    YAMAZAKI, O
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C484 - C484
  • [22] The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD
    Hao, Yongliang
    Gong, Hao
    CHEMICAL VAPOR DEPOSITION, 2008, 14 (1-2) : 9 - 13
  • [23] Transparent conductive ZnO thin films prepared by plasma-enhanced CVD: Effect of aluminum dopant
    Kondo, K
    Ohgishi, A
    Tanaka, Z
    KAGAKU KOGAKU RONBUNSHU, 2001, 27 (02) : 282 - 284
  • [24] ZINC-OXIDE THIN-FILMS PREPARED BY ELECTRON-CYCLOTRON RESONANCE PLASMA CVD
    MANABE, Y
    MITSUYU, T
    YAMAZAKI, O
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C486 - C486
  • [25] TITANIUM DISULFIDE THIN-FILM PREPARED BY PLASMA CVD
    KIKKAWA, S
    MIYAZAKI, M
    KOIZUMI, M
    JOURNAL OF MATERIALS RESEARCH, 1990, 5 (12) : 2894 - 2901
  • [26] INTRINSIC STRESS IN DIAMOND FILMS PREPARED BY MICROWAVE PLASMA CVD
    WINDISCHMANN, H
    EPPS, GF
    CONG, Y
    COLLINS, RW
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (04) : 2231 - 2237
  • [27] PLASMA-ASSISTED CVD OF THIN POLYSILICON FILMS
    BURGER, WR
    DONAHUE, TJ
    REIF, R
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (08) : C325 - C325
  • [28] TEM OBSERVATIONS OF DIAMOND FILMS PREPARED BY MICROWAVE PLASMA CVD
    ETO, H
    TAMOU, Y
    OHSAWA, Y
    KIKUCHI, N
    DIAMOND AND RELATED MATERIALS, 1992, 1 (2-4) : 373 - 379
  • [29] THERMAL-STABILITY OF SINXCY FILMS PREPARED BY PLASMA CVD
    MORIYAMA, M
    ICHINO, T
    HAYASHI, N
    KAMATA, K
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1993, 101 (07): : 757 - 763
  • [30] Plasma CVD of hydrogenated boron-carbon thin films from triethylboron
    Imam, Mewlude
    Hoglund, Carina
    Schmidt, Susann
    Hall-Wilton, Richard
    Birch, Jens
    Pedersen, Henrik
    JOURNAL OF CHEMICAL PHYSICS, 2018, 148 (03):
12345