ION BEAM SYSTEM FOR IMPLANTING INDUSTRIAL PRODUCTS OF VARIOUS SHAPES.

被引:0
|
作者
Denholm, A.S. [1 ]
Wittkower, A.B. [1 ]
机构
[1] Zymet Inc, Danvers, MA, USA, Zymet Inc, Danvers, MA, USA
关键词
D O I
暂无
中图分类号
学科分类号
摘要
6
引用
收藏
页码:88 / 93
相关论文
共 50 条
  • [41] Determination of small-field beam shapes using ion chamber measurements
    Herrup, D
    Chu, JC
    Lee, HR
    Pankuch, M
    MEDICAL PHYSICS, 2004, 31 (06) : 1878 - 1878
  • [42] AN ION-BEAM DEFLECTOR FOR USE IN THE ANALYSIS OF NEUTRAL PRODUCTS OF ION FRAGMENTATIONS
    HOLMES, JL
    MOMMERS, AA
    ORGANIC MASS SPECTROMETRY, 1984, 19 (09): : 460 - 461
  • [43] An ion guide for the production of a low energy ion beam of daughter products of α-emitters
    Tordoff, B.
    Eronen, T.
    Elomaa, V. V.
    Gulick, S.
    Hager, U.
    Karvonen, P.
    Kessler, T.
    Lee, J.
    Moore, I.
    Popov, A.
    Rahaman, S.
    Rinta-Antila, S.
    Sonoda, T.
    Asysto, J.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 252 (02): : 347 - 353
  • [44] Beam Scanning System of an Industrial Electron Accelerator
    Borisov, M. A.
    Shvedunov, V. I.
    MOSCOW UNIVERSITY PHYSICS BULLETIN, 2024, 79 (02) : 291 - 300
  • [45] Ion beam imprinting system for nanofabrication
    Ji, Qing
    Chen, Ye
    Ji, Lili
    Jiang, Ximan
    Leung, Ka-Ngo
    MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) : 796 - 799
  • [46] Maskless ion beam lithography system
    Lee, Y
    Gough, RA
    King, TJ
    Ji, Q
    Leung, KN
    McGill, RA
    Ngo, VV
    Williams, MD
    Zahir, N
    MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) : 469 - 472
  • [47] Dual ion beam epitaxy system
    Shijun, Su
    Weisheng, Jiang
    Fuguang, Qin
    Xiangming, Wang
    Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1992, 70 (1-4):
  • [48] Industrial application of ion beam assisted deposition on medical implants
    Lee, In-Seop
    Zhao, Baohong
    Lee, Gun-Hwan
    Choi, Seong-Ho
    Chung, Sung-Min
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (9-11): : 5132 - 5137
  • [49] High intensity pulsed ion beam sources and their industrial applications
    Remnev, GE
    Isakov, IF
    Opekounov, MS
    Matvienko, VM
    Ryzhkov, VA
    Struts, VK
    Grushin, II
    Zakoutayev, AN
    Potyomkin, AV
    Tarbokov, VA
    Pushkaryov, AN
    Kutuzov, VL
    Ovsyannikov, MY
    SURFACE & COATINGS TECHNOLOGY, 1999, 114 (2-3): : 206 - 212
  • [50] A gigawatt power pulsed ion beam generator for industrial applications
    Pushkarev, Alexander I.
    Isakova, Yulia I.
    SURFACE & COATINGS TECHNOLOGY, 2013, 228 : S382 - S384