Surface characterization of nickel alloy plasma-treated by O2/CF4 mixture

被引：0
|
作者：
机构：
[1] Chan-Park, Mary B.
[2] Gao, Jianxia
[3] Koo, Arthur H.L.
来源：
Chan-Park, M.B. (mbechan@ntu.edu.sg) | 1979年 / VSP BV卷 / 17期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Nanostructured PVDF membrane for MD application by an O2 and CF4 plasma treatment
    Jeong, Seongpil
    Shin, Bongsu
    Jo, Wonjin
    Kim, Ho-Young
    Moon, Myoung-Woon
    Lee, Seockheon
    DESALINATION, 2016, 399 : 178 - 184
  • [42] Model for photoresist trim etch in inductively coupled CF4/O2 plasma
    Rauf, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (01): : 202 - 211
  • [43] Effect of mixing CF4 with O2 on electron characteristics of capacitively coupled plasma
    Seol, Youbin
    Chang, Hong Young
    Ahn, Seung Kyu
    You, Shin Jae
    PHYSICS OF PLASMAS, 2023, 30 (01)
  • [44] Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2
    Nabesawa, Hirofumi
    Hiruma, Takaharu
    Hitobo, Takeshi
    Wakabayashi, Suguru
    Asaji, Toyohisa
    Abe, Takashi
    Seki, Minoru
    AIP ADVANCES, 2013, 3 (11):
  • [45] Accumulation of fluorine in CF4 plasma-treated AlGaN/GaN heterostructure interface: An experimental investigation
    Basu, Anirban
    Adesida, Ilesanmi
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (03)
  • [46] Current Drops in CF4 Plasma-Treated AlGaN/GaN Heterojunction in Polar Gas Ambient
    Ma, Ying
    Chen, Liang
    Dong, Zhihua
    Hong, Yifang
    Xiao, Yang
    Xin, Yijie
    Zhang, Bin
    Qin, Hua
    Zhang, Ting
    Zhang, Xiaodong
    Yu, Guohao
    Cheng, Zhiqun
    Mao, Lingfeng
    Cai, Yong
    ELECTRONICS, 2023, 12 (08)
  • [47] XPS AND SSIMS STUDIES ON CF4/O2PLASMA TREATED POLYCARBONATE
    OCCHIELLO, E
    MORRA, M
    GARBASSI, F
    ANGEWANDTE MAKROMOLEKULARE CHEMIE, 1989, 173 : 183 - 193
  • [48] INVESTIGATION OF PLASMA PARAMETERS IN DUAL ANTENNA CF4/Ar/O2 INDUCTIVELY COUPLED PLASMA
    Park, Sangho
    Han, Duksun
    Moon, Se Youn
    2016 43RD IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS), 2016,
  • [49] POLYIMIDE ETCHING IN O2/CF4 RF PLASMAS
    YOGI, T
    SAENGER, K
    PURUSHOTHAMAN, S
    SUN, CP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (11) : C471 - C471
  • [50] Surface Analysis of AlGaN Treated with CF4 and Ar Plasma Etching
    Hirai, Shohdai
    Niibe, Masahito
    Kawakami, Retsuo
    Shirahama, Tatsuo
    Nakano, Yoshitaka
    Mukai, Takashi
    E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2015, 13 : 481 - 487
12345